Printed

Fundamentals of Semiconductor Fabrication

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Chapter 1 Introduction 1
Chapter 2 Crystal Growth 17
Chapter 3 Silicon Oxidation 41
Chapter 4 Photolithography 60
Chapter 5 Etching 85
Chapter 6 Diffusion 105
Chapter 7 Ion Implantation 124
Chapter 8 Film Deposition 144
Chapter 9 Process Integration 182
Chapter 10 IC Manufacturing 226
Chapter 11 Future Trends and Challenges 259

This concise introduction to semiconductor fabrication technology covers everything professionals need to know, from crystal growth to integrated devices and circuits. Throughout, the authors address both theory and the practical aspects of each major fabrication step, including crystal growth, silicon oxidation, photolithography, etching, diffusion, ion implantation, and thin film deposition.
. The book integrates computer modeling & simulation tools
throughout.
. Process simulation is used as a tool for what-if analysis and
discussion.
. Comprehensive coverage of process sequences helps readers
connect individual steps into a cohesive whole.

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Ketersediaan

Informasi Detail

Judul Seri

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No. Panggil

621.381.52 MAY f

Penerbit

New Jersey : John Wiley & Sons, Inc., 2004

Deskripsi Fisik

xiii, 305 hal. : ilus. ; 26 cm

Bahasa

English

ISBN/ISSN

0-471-23279-3

Klasifikasi

621.381.52

Tipe Isi

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Tipe Media

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Tipe Pembawa

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Edisi

1st

Subjek

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Info Detail Spesifik

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Pernyataan Tanggungjawab

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Versi lain/terkait

Lampiran Berkas

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